By Kohki Takatoh
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Extra info for Alignment technologies and applications of liquid crystal devices
The cylinder moves down to the substrate while rotating, applies pressure to the substrate, and the stage carrying the substrate moves forward with a constant velocity. After the entire area is buffed, the cylinder moves away, and the stage returns to the initial position. The size of the cylinder and the stage have become larger as the substrate area has become larger. The cloth on the cylinder is changed after processing 2000^4000 substrates, because the cloth becomes too soft. The controllable parameters of the rubbing machine are the gap between the substrate and the cylinder, the cylinder rotation speed, the stage movement velocity, and the number of times each substrate goes through the rubbing process.
9 Planar stack of three dielectric layers used for molecular orientation calculation. Reproduction by permission from . 4 Fig. 10 Relation between the inclination angle of the polymer and the LC pretilt angle as a function of rubbing strength. Permission to print from , courtesy Society for Information Display. the inclination angle of the polymer became saturated at a rubbing strength of approximately L ¼ 2 m. In the case of side chain polymers used for high-pretilt alignment, the retardation had a maximum of 0 nm at normal incidence and decreased at large angles.
34 Photomicrograph of the spacers in a TN-LCD (5 V applied). Top view Rubbing direction of top substrate Molecules Rubbing direction of bottom substrate Glass Spaces Molecules Side view Observation by polarizing microscope Polarizer Polarizer, analyzer Light reflection from disclination line around spacer Analyzer Light reflection from disclination line around spacer V=0 V=V Fig. 35 Alignment model around the spacer beads. The left side is the alignment model when there are no electric fields. The right side is that when the electric field is applied to the LC cell.
Alignment technologies and applications of liquid crystal devices by Kohki Takatoh